System and method for providing phase shift mask passivation...

Details System and method for providing phase shift mask passivation... System and method for providing phase shift mask passivation...

2007-03-21

2010-06-01

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C250S492200

Reexamination Certificate

active

07727682

ABSTRACT:
System and method for providing a passivation layer for a phase shift mask (“PSM”) are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces of at least a portion of the phase shift pattern.

REFERENCES:
patent: 4778693 (1988-10-01), Drozdowicz et al.
patent: 5686206 (1997-11-01), Baum et al.
patent: 6277526 (2001-08-01), Yang
patent: 2005/0058912 (2005-03-01), Lin et al.
patent: 2005/0112476 (2005-05-01), Bellman et al.
patent: 2008/0044740 (2008-02-01), Lin et al.

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