System and method for processing an object

Details System and method for processing an object System and method for processing an object

2011-04-12

2011-04-12

Vanore, David A (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S306000, C250S307000, C250S310000, C250S311000, C250S441110

Reexamination Certificate

active

07923702

ABSTRACT:
A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table.

REFERENCES:
patent: 4197455 (1980-04-01), Blanchard et al.
patent: 4818326 (1989-04-01), Liu et al.
patent: 4820377 (1989-04-01), Davis et al.
patent: 4822450 (1989-04-01), Davis et al.
patent: 5055696 (1991-10-01), Haraichi et al.
patent: 5148024 (1992-09-01), Watanabe
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5435850 (1995-07-01), Rasmussen
patent: 5616921 (1997-04-01), Talbot et al.
patent: 5639699 (1997-06-01), Nakamura et al.
patent: 6538254 (2003-03-01), Tomimatsu et al.
patent: 6627889 (2003-09-01), Ochiai et al.
patent: 6794663 (2004-09-01), Shichi et al.
patent: 6828566 (2004-12-01), Tomimatsu et al.
patent: 6855929 (2005-02-01), Kimba et al.
patent: 6992290 (2006-01-01), Watanabe et al.
patent: 7244932 (2007-07-01), Nakasuji et al.
patent: 7268356 (2007-09-01), Shichi et al.
patent: 7525108 (2009-04-01), Tomimatsu et al.
patent: 2002/0152797 (2002-10-01), McAndrew et al.
patent: 2002/0190036 (2002-12-01), McCay et al.
patent: 2004/0043621 (2004-03-01), Nasser-Ghodsi
patent: 2004/0173759 (2004-09-01), Koops et al.
patent: 2005/0103272 (2005-05-01), Koops et al.
patent: 2005/0167614 (2005-08-01), Kaito
patent: 2006/0225998 (2006-10-01), Song
patent: 2009/0121132 (2009-05-01), Koops et al.
patent: 2009/0152459 (2009-06-01), Buhler et al.
patent: 2010/0072364 (2010-03-01), Wang et al.
patent: 2010/0102223 (2010-04-01), Albiez et al.
patent: 2 354 956 (2002-02-01), None
patent: 40 29 483 (1991-05-01), None
patent: 41 10 118 (1991-10-01), None
patent: 44 21 517 (1995-01-01), None
patent: 10208043 (2003-09-01), None
patent: 0 483 517 (1992-05-01), None
patent: 1 411 538 (2004-04-01), None
patent: 2 408 909 (1979-06-01), None
patent: 2002-134057 (2002-05-01), None
patent: 2003-308801 (2003-10-01), None
patent: 10-2002-0014761 (2002-02-01), None
patent: WO 97/49116 (1997-12-01), None
patent: WO 2006/025968 (2006-03-01), None
Bret, T., “Physico-Chemical Study of the Focused Electron Beam Induced Deposition Process,” Dissertation No. 3321, Lausanne EPFL, Switzerland, 2005, pp. 1-220.
Ray, V., “Gas Delivery and Virtual Process Chamber Concept for Gas-Assisted Material Processing in a Focused Ion Beam System,” Journal of Vacuum Science and Technology B: Micoelectronics and Nanometer Structures, vol. 22, No. 6, Nov. 2004, pp. 3008-3011.
Theil, J. A., “Gas Distribution Through Injection Manifolds in Vacuum Systems,” Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 13, No. 2, Mar. 1995, pp. 442-447.
Maszara, W. P., et al., “Bonding of Silicon Wafers for Silicon-on-Insulator,” J. Appl. Phys. 64 (10), Nov. 15, 1988, pp. 4943-4950.
Wiegand, M., et al., “Wafer Bonding of Silicon Wafers Covered with Various Surface Layers,” Sensors and Actuators 86 (2000), pp. 91-95.
Taraschi G., et al., “Strained Si, SiGe, and Ge On-Insulator: Review of Wafer Bonding Fabrication Techniques,” Solid-State Electronics 48, 2004, pp. 1297-1305.
Koops et al., “High-resolution electron-beam induced deposition” Journal of Vacuum Science and Technology: Part B, AVS/AIP, Melville, NY, vol. 6, No. 1, Jan. 1, 1988, pp. 477-481, XP000616834, ISSN: 1071-1023.
European Search Report issued in corresponding European Application No. 08019703.1-2208/2061066 on Dec. 8, 2010.

Affiliated with

Also associated with

Rating

System and method for processing an object does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with System and method for processing an object, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for processing an object will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2678048