System and method for printing a pattern

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S322000

Reexamination Certificate

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10765673

ABSTRACT:
A system and method for printing a pattern, using third harmonic generation. The method includes: (i) determining an illumination scheme in response to the pattern; and (ii) directing, in response to the determination, at least one beam of radiation having a fundamental frequency, via a medium, towards an intermediate layer such as to excite at least one third harmonic beam that propagates through at least a portion of the intermediate layer towards a radiation sensitive layer; whereas the radiation sensitive layer is sensitive to third harmonic radiation and is substantially not sensitive to radiation of the fundamental frequency.

REFERENCES:
patent: 6020591 (2000-02-01), Harter et al.
patent: 6316153 (2001-11-01), Goodman et al.
patent: 03-203823 (1991-09-01), None
Tsang, Thomas Y.F., “Optical Third Harmonic Generation at Interfaces”, Nov. 1995, The American Physical Society, Physical Review A, vol. 52 (5), p. 4116-4125.
Barad, Y, et al., “Nonlinear Scanning Laser Microscopy by Third Harmonic Generation”,Appl. Phys. Lett. 70(8), (Feb. 24, 1997), 3 pgs.
Meshulach, D, et al., “Measurement of Ultrashort Optical Pulses by Third-Harmonic Generation”,J. Opt. Soc. Am. B/vol. 14, (Aug. 8, 1997), 4 pgs.
Tsang, Thomas, et al., “Frequency-Resolved Optical-Gating Measurements of Ultrashort Pulses Using Surface Third-Harmonic Generation”, vol. 21, No. 17/Optics Letters, (Sep. 1, 1996), 3 pgs.
Wu, En S, et al., “Two-Photon Lithography For Microelectronic Application”,SPIE-vol. 1674Optical/Laser Microlithography V, (1992), 7 pgs.
Yelin, D, et al., “Third-Harmonic Microscopy With A Titanium-Sapphire Laser”,Appl. Phys. B 74, (Jun. 27, 2002), 5 pgs.

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