Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-02-09
2009-10-13
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C430S394000
Reexamination Certificate
active
07601466
ABSTRACT:
A method for photolithography in semiconductor manufacturing includes providing a mask with first and second focus planes for a wafer. The wafer includes corresponding first and second wafer regions. The first wafer region receives a first image during a first exposure utilizing the first focus plane. The second wafer region receives a second image during a second exposure utilizing the second focus plane.
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Chang Yuh-Sen
Chen Kuei Shun
Hsu Chia-Sui
Lu Hsiao-Tzu
Yen Yung-Sung
Fraser Stewart A
Haynes and Boone LLP
Huff Mark F
Taiwan Semiconductor Manufacturing Company , Ltd.
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