Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Reexamination Certificate
2011-06-28
2011-06-28
Duda, Kathleen (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
C430S311000, C430S022000
Reexamination Certificate
active
07968258
ABSTRACT:
A method for photolithography in semiconductor manufacturing includes providing one or more masks for a wafer; defining a reference focus plane of a first mask of the one or more masks; defining a reference focus plane of a second mask of the one or more masks; and determining the best focus for the second mask based on the best focus of the first mask and the Z direction difference of the first and second masks, using the reference focus planes of the first and second masks.
REFERENCES:
patent: 2003/0119216 (2003-06-01), Weed
patent: 2003/0170552 (2003-09-01), Miyashita et al.
patent: 2006/0285098 (2006-12-01), Fukumoto et al.
patent: WO 2005/001912 (2005-01-01), None
Taiwanese Patent Office, Office Action mailed Feb. 26, 2010, Application No. 095113487, 5 pages.
Dai Yi-Ming
Kung Chun-Hung
Liao Chi-Hung
Su Wei-Yu
Duda Kathleen
Haynes and Boone LLP
Raymond Britanny
Taiwan Semiconductor Manufacturing Company , Ltd.
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