System and method for phase shift assignment

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Reexamination Certificate

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07421676

ABSTRACT:
A semiconductor design is provided having at least one feature at one of a line end and a line junction, and phase regions. At least one cut line is added to at least one of such features at line ends and such features at line junctions. Phases are assigned to the phase regions. The manufacturing of a photomask with the assigned phase regions is directed.

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Pierrat, Christophe, “Full Phase-Shifting Methodology for 65nm Node Lithography”, Oct. 1, 2002, White Paper on www.Synopsys.com web site.
Pierrat, Christophe, Frank Driessen, and Geert Vandenberghe “Full Phase-Shifting Methodology for 65nm Node Lithography”, Proceedings of SPIE—vol. 5040, Optical Microlithography XVI, Jun. 2003, pp. 282-293.

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