System and method for performing multi-resolution lithography

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S313000

Reexamination Certificate

active

10313309

ABSTRACT:
A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a second pattern in a second photo-resist, and transferring the second pattern in the second photo-resist to the mask layer. In various embodiments, the method may further include the steps of forming a first pattern in a first photo-resist, forming a second pattern in a second photo-resist, and transferring the first and second patterns to a target layer.

REFERENCES:
patent: 4496419 (1985-01-01), Nulman et al.
patent: 6472317 (2002-10-01), Wang et al.
patent: 6605541 (2003-08-01), Yu
patent: 09-213606 (1997-08-01), None

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