System and method for monitoring contamination

Details System and method for monitoring contamination System and method for monitoring contamination

2006-08-15

2006-08-15

Lebentritt, Michael (Department: 2812)

Optics: measuring and testing

With sample preparation

C438S014000

Reexamination Certificate

active

07092077

ABSTRACT:
The present invention provides passive sampling systems and methods for monitoring contaminants in a semiconductor processing system. In one embodiment, that passive sampling system comprises a collection device in fluid communication with a sample line that provides a flow of gas from a semiconductor processing system. The collection device is configured to sample by diffusion one or more contaminants in the flow of gas.

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