System and method for making photomasks

Details System and method for making photomasks System and method for making photomasks

2011-03-15

2011-03-15

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S313000, C430S316000, C430S328000

Reexamination Certificate

active

07906271

ABSTRACT:
The present disclosure is directed a method for preparing a system of photomask patterns for implementing a drawn pattern on a substrate with a multi-patterning lithography process. The method comprises receiving data describing a drawn pattern. A first photomask pattern is formed for implementing a region of the drawn pattern on the substrate. A second photomask pattern is formed comprising one or more pattern features having longitudinal edges for implementing the region of the drawn pattern on the substrate, wherein at least 90% of all the longitudinal edges of the second photomask pattern that are positioned within the region are oriented in substantially the same direction. Both a system for forming the photomask patterns and a process for patterning a device using the photomask patterns are also disclosed.

REFERENCES:
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