System and method for inspecting wafers in a laser marking...

Details System and method for inspecting wafers in a laser marking... System and method for inspecting wafers in a laser marking...

2008-01-01

2008-01-01

Nguyen, Ha Tran (Department: 2829)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237200

Reexamination Certificate

active

11118192

ABSTRACT:
An illumination system is disclosed for use in a semiconductor wafer back side inspection assembly. The illumination system includes an illumination source that is configured to direct illumination toward a highly reflective and directionally reflective surface at an angle α of about 45 degrees to about 75 degrees with respect to the surface.

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