Abrading – Precision device or process - or with condition responsive... – Computer controlled
Reexamination Certificate
2006-12-26
2006-12-26
Morgan, Eileen P. (Department: 3723)
Abrading
Precision device or process - or with condition responsive...
Computer controlled
C451S010000, C451S011000, C451S303000, C451S307000
Reexamination Certificate
active
07153182
ABSTRACT:
A system and method for in situ measurement and maintenance of preferred pad smoothness in a CMP process is disclosed. The system includes a linear polisher having one or more sensors for detecting fluid pressure, fluid flow or motor current at the linear polisher during a polishing process. A controller receiving the information provided by the sensors includes an algorithm for adjusting the pad conditioning process to achieve a desired pad smoothness based on the sensor data. The method includes obtaining baseline data on preferred linear polisher characteristics associated with desired pad smoothness and using the baseline data to adjust a pad conditioning regimen on a linear polisher to achieve the desired pad smoothness in situ.
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Norton Peter Richard
Taylor Travis R.
Yi Jingang
Brinks Hofer Gilson & Lione
Lam Research Corporation
Morgan Eileen P.
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