System and method for improving spatial resolution of...

Radiant energy – Irradiation of objects or material

Reexamination Certificate

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C250S307000, C250S306000, C250S311000, C257S014000, C257S010000, C257S009000, C257S028000, C257S030000, C438S003000, C438S105000

Reexamination Certificate

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07102145

ABSTRACT:
A method for enhancing spatial resolution of a transmission electron microscopy TEM) system configured for electron holography. In an exemplary embodiment, the method includes configuring a first lens to form an initial virtual source with respect to an incident parallel beam, the initial virtual source positioned at a back focal plane of said first lens. A second lens is configured to form an intermediate virtual source with respect to the incident parallel beam, the position of said intermediate virtual source being dependent upon a focal length of the first lens and a focal length of the second lens. A third lens is configured to form a final virtual source with respect to the incident parallel beam, wherein the third lens has a focal length such that a front focal plane of the third lens lies beyond the position of the intermediate virtual source, with respect to a biprism location.

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patent: 6573501 (2003-06-01), Kaneyama et al.
patent: 6617580 (2003-09-01), Voelkl
patent: 6759656 (2004-07-01), Tomita
Y. Y. Wang et al.; “Variable Magnification of Electron Holography for Junction Profiling of Semiconductor Devices with Dual Lens System on JEOL JEM-2010F;” JOEL News vol. 39, No. 1; 6(2004); pp. 6-9.
Y. Y. Wang et al; “Off-axis electron holography with a dual-lens imaging system and its usefulness in 2-D potential mapping of semiconductor devices;” found at www.sciencedirect.com.

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