System and method for holographic fabrication and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C430S001000, C430S002000

Reexamination Certificate

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10677804

ABSTRACT:
A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.

REFERENCES:
patent: 5900637 (1999-05-01), Smith
patent: 6107000 (2000-08-01), Lee et al.
patent: 6285817 (2001-09-01), Hobbs
patent: 0 737 902 (1996-10-01), None
“Fabrication of holographic microlenses using a deep UV lithographed zone plate,” Ming et al.Applied Optics. Dec. 1990. vol. 29, No. 34.
“Fabrication of diffractive optical elements using a single optical exposure with a gray level mask,” Daschner et al.J. Vac. Sci. Technol. B., Nov./Dec. 1995, vol. 13.

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