Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-01-02
2007-01-02
Hassanzadeh, Parviz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S724000
Reexamination Certificate
active
10619731
ABSTRACT:
A highly dynamic heating and/or chilling chamber for processing semiconductor wafers. The chamber has uniform heat and gas flow distribution in order to minimize the temperature gradient at different points of the wafer.
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Dhingra Rakesh
Hassanzadeh Parviz
Parsons Hsue & de Runtz LLP
SensArray Corporation
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