System and method for haze control in semiconductor processes

Details System and method for haze control in semiconductor processes System and method for haze control in semiconductor processes

2006-09-13

2009-02-03

Nguyen, Sang (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237400

Reexamination Certificate

active

07486391

ABSTRACT:
A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and cleaning the semiconductor reticle. Also included is a haze forecasting method for haze control on a semiconductor reticle, including scanning a plurality of semiconductor wafers, identifying repeating defects in the semiconductor wafers, storing the repeating defects in a database as known repeating defects, and identifying an additional repeating defect that is not a known repeating defect, the additional repeating defect caused by semiconductor reticle haze.

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Jerry X. Chen et al., “Haze defect control and containment in a high volume DRAM manufacturing environment”, 25TH Annual BACUS Symposium on Photomask Technology, Proc. Of SPIE, vol. 5992, (2005), 11 pages.

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