Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-04-05
2005-04-05
Siek, Vuthe (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
06877144
ABSTRACT:
A system and method for generating a mask layout file to reduce power supply voltage fluctuations in an integrated circuit are disclosed. The method includes analyzing a pattern in a mask layout file to identify a region in the pattern to add one or more decoupling capacitors. Once the region is identified, a feature located in the identified region is moved based on a design rule from a first position to a second position in the mask layout file to create a space in the identified region. The decoupling capacitors are automatically placed in the space in the identified region.
REFERENCES:
patent: 6446016 (2002-09-01), Zhu
patent: 6487702 (2002-11-01), Lin et al.
patent: 6523159 (2003-02-01), Bernstein et al.
patent: 6618843 (2003-09-01), Dansky et al.
patent: 20020166109 (2002-11-01), Rittman et al.
patent: 20040064800 (2004-04-01), Korobkov
patent: 20040073881 (2004-04-01), Nassif et al.
U.S. Appl. No. 10/378,452 entitled “Photomask for Reducing Power Supply Voltage Fluctuations in an Integrated Circuit and Integrated Circuit Manufactured with the Same” filed by Rittman et al. on Mar. 3, 2003; 49 pages.
Oren Micha
Rittman Danny
Baker & Botts L.L.P.
DuPont Photomasks, Inc.
Siek Vuthe
LandOfFree
System and method for generating a mask layout file to... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for generating a mask layout file to..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for generating a mask layout file to... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3373744