Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-11-08
1996-12-31
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 20419227, 2041923, 427162, 427164, 216 24, C23C 1434
Patent
active
055890423
ABSTRACT:
A system and method for fabricating optical ramp filters utilizes an ion beam sputter etching system and a shaped aperture mask to produce optical ramp filters with precise control over the transmission and reflectance properties of the filter. The ion beam is passed through a shaped aperture whose width varies as a function of its length. The resultant shaped ion beam is used to etch a uniform reflective layer that was previously deposited on a transparent substrate. The substrate and the reflective layer are translated relative to the shaped aperture so that the shaped ion beam "travels" across the reflective layer. Different parts of the reflective layer are exposed to the ion beam for different amounts of time as a result of the varying width of the shaped ion beam. The result is a reflective layer with a nonuniform depth profile (a ramp filter). The method allows control of the layer thickness with a precision of less than 0.5 nm. This precision exceeds that achieved with prior fabrication methods that control the thickness of the layer during the deposition (or growth) stage.
REFERENCES:
patent: 4359373 (1982-11-01), Hammer
patent: 4456515 (1984-06-01), Krueger et al.
patent: 4457803 (1984-07-01), Takigawa
patent: 4465551 (1984-08-01), Horwitz
patent: 4690555 (1987-09-01), Ellerbroek
patent: 4727000 (1988-02-01), Ovshinsky et al.
patent: 4888201 (1989-12-01), Veenvliet et al.
patent: 4901667 (1990-02-01), Suzuki et al.
patent: 5035787 (1991-07-01), Parker et al.
Reynard Enterprises, Inc. .TM. "Linear Variable Neutral Density Fitre" Commercial brochure, pp. 1-2.
OCLI, "Selectraband.TM. Linear Variable Filters" Comercial brochure, pp. 1-2.
Hass, George, Ed. and Thun, Rudolf E, "Physics of Thin Films--Advances in Research and Development", (1966) Academic Press, vol. 3, New York and London, pp. 47--47.
Brien, B. O. and Russell, T. A. "Program of Sessions for Contributed Papers" (1934) J. Opt. Soc. Am., 24, 54.
Chopra, Thin Film Phenomena, McGraw-Hill, New York (1969), pp. 10, 11, 21 and 35.
Garvin Hugh L.
Robinson Klaus
Denson-Low W. K.
Duraiswamy V. D.
Hughes Aircraft Company
Nguyen Nam
LandOfFree
System and method for fabrication of precision optical ramp filt does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with System and method for fabrication of precision optical ramp filt, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and System and method for fabrication of precision optical ramp filt will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1139346