Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2008-09-03
2010-12-14
Vanore, David A (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200, C250S492230, C250S494100, C250S3960ML, C355S067000
Reexamination Certificate
active
07851774
ABSTRACT:
A direct-write (DW) exposure system is provided which includes a stage for holding a substrate and configured to scan the substrate along an axis during exposure, a data processing module for processing pattering data and generating instructions associated with the patterning data, and an exposure module that includes a plurality of beams that are focused onto the substrate such that the beams cover a width that is larger than a width of a field size and a beam controller that controls the plurality of beams in accordance with the instructions as the substrate is scanned along the axis. The widths are in a direction different from the axis.
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Chinese Patent Office, Office Action of Apr. 13, 2010, Application No. 200910136076.6, 8 pages.
Chen Jeng-Horng
Gau Tsai-Sheng
Lin Burn Jeng
Lin Shy-Jay
Haynes and Boone LLP
Taiwan Semiconductor Manufacturing Company , Ltd.
Vanore David A
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