System and method for detecting particles on substrate-supportin

Optics: measuring and testing – Inspection of flaws or impurities – Having predetermined light transmission regions

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356141, 356445, 356337, 356338, G01N 2100

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active

059780789

ABSTRACT:
A system (10, 110, 210) for detecting particles (144) on a surface of a substrate-supporting chuck (14, 114, 214) including an inspection subsystem (128, 130, 131, 116, 250, 252, 222, 216) for analyzing the surface of the chuck (14, 114, 214) to determine if any particles (144) are thereon, a movable table (16, 116, 216) for holding the chuck (14, 114, 214) to inspect it and for moving the chuck (14, 114, 214) during inspection, and a control unit (22, 122, 222) for moving the movable table (16, 116, 216) relative to the inspection subsystem (128, 130, 131, 116, 250, 252, 222, 216) to inspect the surface of the chuck (14, 114, 214) and to produce an indication signal if a particle (144) is detected on the surface of the chuck (14, 114, 214). A method for detecting a particle (114) on a substrate-supporting chuck (14, 114, 214) of photolithography equipment (18, 118) includes the steps of providing an inspection subsystem (128, 130, 131, 116, 250, 252, 222, 216); using a movable table (16, 116, 216) associated with a stepper (18, 118) to move a substrate-supporting chuck (14, 114, 214) relative the inspection subsystem (128, 130, 116, 250, 252, 222, 216), and using the inspection subsystem (128, 130, 131, 116, 250, 252, 222, 216) and movable table (16, 116, 216) to inspect a surface of the substrate-supporting chuck (14, 114, 214) to locate any particles thereon.

REFERENCES:
patent: 4633504 (1986-12-01), Wihl
patent: 4893932 (1990-01-01), Knollenberg
patent: 5363172 (1994-11-01), Tokuda
patent: 5369272 (1994-11-01), Eguchi
patent: 5515453 (1996-05-01), Hennessey et al.
patent: 5563702 (1996-10-01), Emery et al.

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