Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2011-08-02
2011-08-02
McDonald, Rodney G (Department: 1724)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192120, C204S298030, C204S298080
Reexamination Certificate
active
07988833
ABSTRACT:
A system and method for detecting the potential of non-cathode arcing in a plasma generation apparatus, such as a physical vapor deposition chamber. The system and method involve computing a statistical parameter of cathode-arcing event data in the chamber and performing a pattern recognition technique to a moving average of the statistical parameter.
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McDonald Rodney G
Schneider Electric USA , Inc.
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