System and method for designing and manufacturing LSI

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07370304

ABSTRACT:
An LSI designing system includes a memory;, a database configured to store a layout layer definition file, and a control section configured to refer to the database to build up a plurality of layout layers in the memory based on the layout layer definition file. The plurality of layout layers are provided for extending directions of patterns in one of physical layers of an LSI to be formed. The control section divides each of the patterns into pattern structures based on the extending directions, and assigns each of the pattern structures to a corresponding one of the plurality of layout layers.

REFERENCES:
patent: 6033812 (2000-03-01), Miyagawa
patent: 6308143 (2001-10-01), Segawa
patent: 6813756 (2004-11-01), Igarashi et al.
patent: 2002/0184606 (2002-12-01), Ohba et al.
patent: 1135602 (2004-01-01), None

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