System and method for depositing a material on a substrate

Details System and method for depositing a material on a substrate System and method for depositing a material on a substrate

2011-04-26

2011-04-26

Meeks, Timothy H (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

C118S719000, C118S726000

Reexamination Certificate

active

07931937

ABSTRACT:
A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The mixture of vapor and carrier gas are remixed to achieve a uniform vapor/carrier gas composition, which is directed toward a surface of a substrate, such as a glass substrate, where the vapor is deposited as a uniform film.

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