System and method for critical dimension reduction and pitch...

Details System and method for critical dimension reduction and pitch... System and method for critical dimension reduction and pitch...

2005-06-30

2008-09-23

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07427458

ABSTRACT:
A method of forming a feature includes forming a mask of a first material on an underlying layer, the mask having an incorrect profile. The profile of the mask is corrected and a feature is formed in the underlying layer. A system for forming a feature is also disclosed.

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patent: 6936383 (2005-08-01), Mazur et al.
patent: 7056624 (2006-06-01), Kokubo

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