Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-06-14
2005-06-14
Garbowski, Leigh M. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
06907587
ABSTRACT:
A system and method for correcting connectivity errors in a mask layout are disclosed. The method includes comparing a first connection in a mask layout file to a second connection in a schematic netlist. A connectivity error is identified if the first connection does not match the second connection and the identified connectivity error is automatically corrected in the mask layout file.
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Oren Micha
Rittman Dan
Baker & Botts L.L.P.
DuPont Photomasks, Inc.
Garbowski Leigh M.
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