Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Patent
1998-03-10
2000-02-08
Breneman, Bruce
Etching a substrate: processes
Gas phase etching of substrate
With measuring, testing, or inspecting
156345, B31D 300, C23F 102
Patent
active
060224835
ABSTRACT:
A system for controlling the pressure in a chamber with a computer controlled exhaust throttle valve. A characterization relationship describes the static properties of the valve geometry, valve actuation mechanism and gas flow properties. This characterization relationship can comprise a theoretical or empirical function which associates a sufficient number of valve positions with the corresponding pressure, and may be parameterized by other auxiliary variables such as inlet gas flow values, gas types and compositions. An inverse relationship between the current measurable variables of the process, such as pressure, inlet flows and other auxiliary parameters is defined. A linearization method uses the inverse relationship to modify the effect of the valve positioning on the corresponding value of pressure in such a way that the combined behavior of the process and the linearization method yields a linear relationship between a new control variable and the pressure. A linear feedback control method then controls the modified, linearized system.
REFERENCES:
patent: 5758680 (1998-06-01), Kaveh et al.
patent: 5813426 (1998-09-01), Tan et al.
patent: 5816285 (1998-10-01), Ohmi et al.
Breneman Bruce
Intergrated Systems, Inc.
McGuthry-Banks Tima
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