Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates
Reexamination Certificate
2008-07-31
2011-10-11
Kelly, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making printing plates
C430S253000, C430S254000, C430S256000, C430S005000
Reexamination Certificate
active
08034540
ABSTRACT:
A method of making a relief image on a flexographic print plate including imagewise exposing a mask including an imageable material disposed on a mask substrate to form an imaged mask having a mask image in the imageable material disposed on the mask substrate, the mask image including mask image areas each having a highlight value. The method further includes laminating the imaged mask to a front surface of a flexographic printing plate precursor, and exposing selected areas of the flexographic printing plate precursor to an imagewise addressable curing radiation via a back surface of the flexographic printing plate precursor based on the highlight values of corresponding mask image areas of the mask image.
REFERENCES:
patent: 4046071 (1977-09-01), Mizuno et al.
patent: 4927723 (1990-05-01), Cusdin
patent: 5455416 (1995-10-01), Zertani et al.
patent: 5552263 (1996-09-01), Schober et al.
patent: 5813342 (1998-09-01), Strong
patent: 5850789 (1998-12-01), Rudolf et al.
patent: 6855482 (2005-02-01), McLean et al.
patent: 7126724 (2006-10-01), McCrea et al.
patent: 7245402 (2007-07-01), McCrea et al.
patent: 7279254 (2007-10-01), Zwadlo
patent: 2004/0177782 (2004-09-01), McCrea et al.
patent: 2005/0227182 (2005-10-01), Ali et al.
patent: 2006/0257780 (2006-11-01), Zwadlo
patent: 2007/0014929 (2007-01-01), Eggers
patent: 0 295 818 (1988-12-01), None
Eastman Kodak Company
Kelly Cynthia
Robinson Chanceity
Tucker J. Lanny
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