Symmetrical semiconductor reactor

Details Symmetrical semiconductor reactor Symmetrical semiconductor reactor

2005-05-10

2005-05-10

Hassanzadeh, Parviz (Department: 1763)

Coating apparatus

Gas or vapor deposition

With treating means

C118S733000, C118S715000, C156S345310, C156S156000

Reexamination Certificate

active

06889627

ABSTRACT:
A symmetrical semiconductor reactor for semiconductor processing, comprising a liner, a process chamber, a valve chamber, a slot valve plate, a liner aperture plate, a rod, and an actuator. The liner has a liner aperture adapted to provide passage for a wafer and to receive the liner aperture plate. The process chamber is coupled to the liner and the valve chamber. The actuator is coupled to the slot valve plate and moves the slot valve plate from the “closed” to the “open” position and vice versa. Since the slot valve plate is coupled to the liner aperture plate by the rod, the actuator is capable of moving the slot valve plate and the liner aperture plate at the same time. However, the precise movements of the liner aperture plate are dependent on the particular rod embodiment.

REFERENCES:
patent: 5641375 (1997-06-01), Nitescu et al.
patent: 6165271 (2000-12-01), Zhao et al.
patent: 6192827 (2001-02-01), Welch et al.
patent: 6221782 (2001-04-01), Shan et al.
patent: 6408786 (2002-06-01), Kennedy et al.
patent: 6647918 (2003-11-01), Welch et al.
patent: 2000114179 (2000-04-01), None

Affiliated with

Also associated with

Rating

Symmetrical semiconductor reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Symmetrical semiconductor reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Symmetrical semiconductor reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3452939