Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2007-10-16
2007-10-16
Meeks, Timothy (Department: 1762)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C427S595000, C427S569000, C118S7230AN, C118S7230MP, C118S7230ER, C438S710000, C438S718000
Reexamination Certificate
active
10642463
ABSTRACT:
A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery mechanism includes a plurality of component outputs for outputting the component to a desired region of the process chamber. The component delivery mechanism further includes a spatial distribution switch coupled to the plurality of component outputs. The spatial distribution switch is arranged for directing the component to at least one of the plurality of component outputs. The component delivery mechanism also includes a single component source coupled to the spatial distribution switch. The single component source is arranged for supplying the component to the spatial distribution switch.
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Gottscho Richard A.
Steger Robert J.
Beyer & Weaver, LLP
Lam Research Corporation
Meeks Timothy
Turocy David
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