Sweeping method and magnet track apparatus for magnetron sputter

Details Sweeping method and magnet track apparatus for magnetron sputter Sweeping method and magnet track apparatus for magnetron sputter

1991-09-12

1993-02-23

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429819, 2042982, C23C 1434

Patent

active

051887177

ABSTRACT:
A magnetism sputtering apparatus is provided with a movable magnetic track which is a closed curve essentially in the shape of a kidney bean, the closed curve being generated in part by a spiral curve. The magnet track is positioned behind the target of the sputtering apparatus, and it is simultaneously rotated about a center of rotation and caused to oscillate substantially radially with respect to said center of rotation. The combined rotational and oscillatory motion provides a substantially uniform magnetic flux over a major annular portion of the target while ensuring that some degree of sputtering occurs in all regions of the target, including regions near the center and periphery of the target. This arrangement has been found suitable for providing a highly uniform deposition of target material on large diameter substrates.

REFERENCES:
patent: 4714536 (1987-12-01), Freeman et al.
patent: 4872964 (1989-10-01), Suzuki et al.
patent: 4995958 (1991-02-01), Andersen et al.

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