Suspension system for semiconductor reactors

Details Suspension system for semiconductor reactors Suspension system for semiconductor reactors

1991-01-29

1993-01-12

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

118731, 118733, 118725, 156345, 403287, H01L 2100

Patent

active

051786818

ABSTRACT:
A suspension system for hanging a susceptor inside a reactor for processing semiconductor wafers. A hanger is provided with a flange at its lower end for supporting the susceptor. A collar has an internal flange which engages with another flange at the upper end of the hanger. The collar flange and the hanger flange each have a trucated, conical contact surface which are in substanitally continuous contact with each other. The mating flanges permit the susceptor to self-center and provide for different rates of thermal expansion of the collar and hanger.

REFERENCES:
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4496828 (1985-01-01), Kusmierz et al.
patent: 4632060 (1986-12-01), Goto et al.
patent: 4668119 (1987-05-01), Galletti
patent: 4756638 (1988-07-01), Neyret

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