Coating apparatus – Gas or vapor deposition
Patent
1991-01-29
1993-01-12
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
118731, 118733, 118725, 156345, 403287, H01L 2100
Patent
active
051786818
ABSTRACT:
A suspension system for hanging a susceptor inside a reactor for processing semiconductor wafers. A hanger is provided with a flange at its lower end for supporting the susceptor. A collar has an internal flange which engages with another flange at the upper end of the hanger. The collar flange and the hanger flange each have a trucated, conical contact surface which are in substanitally continuous contact with each other. The mating flanges permit the susceptor to self-center and provide for different rates of thermal expansion of the collar and hanger.
REFERENCES:
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4496828 (1985-01-01), Kusmierz et al.
patent: 4632060 (1986-12-01), Goto et al.
patent: 4668119 (1987-05-01), Galletti
patent: 4756638 (1988-07-01), Neyret
Deaton Paul L.
Moore Joseph C.
Applied Materials Inc.
Goudreau George
Hearn Brian E.
Hickman Paul L.
LandOfFree
Suspension system for semiconductor reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Suspension system for semiconductor reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Suspension system for semiconductor reactors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1217043