Susceptor for vapor deposition

Coating apparatus – Gas or vapor deposition – With treating means

Patent

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Details

118728, 156345, C23C 1650, H01L 2100, H05H 100

Patent

active

054567572

ABSTRACT:
A novel susceptor used in a chemical vapor deposition device that is made of a ceramic material, specifically, an aluminum nitride material.

REFERENCES:
patent: 5201990 (1993-04-01), Chang et al.
patent: 5211825 (1993-05-01), Saito et al.

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