Susceptor

Details Susceptor Susceptor

2008-07-01

2008-07-01

Hassanzadeh, Parviz (Department: 1792)

Coating apparatus

Gas or vapor deposition

Work support

C118S500000, C118S729000, C118S730000, C118S724000, C118S725000, C118S715000, C156S345510, C156S345520, C156S345530

Reexamination Certificate

active

07393418

ABSTRACT:
A susceptor at least a surface thereof being coated with SiC, includes a recess where an wafer is mounted, the recess having an round portion disposed on a lower portion of an outer circumferential portion of the recess, a ring-shaped SiC crystal growth surface portion provided within the round portion in a range of 0.05 mm or more and 0.3 mm or less defined from an outer circumference vertical portion of the recess and a contact portion, where the susceptor contacts with the wafer on the recess, having a surface roughness Ra in a range of 0.5 μm or more and 3 μm or less.

REFERENCES:
patent: 4424193 (1984-01-01), Koyama et al.
patent: 4624735 (1986-11-01), Koyama et al.
patent: 5200157 (1993-04-01), Toya et al.
patent: 2004/0089236 (2004-05-01), Yokogawa et al.
patent: 56-010921 (1981-02-01), None
patent: 07-335572 (1995-12-01), None
patent: 07-335572 (1995-12-01), None

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