Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-12-26
2006-12-26
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S087000
Reexamination Certificate
active
07153440
ABSTRACT:
A microelectromechanical structure is formed by depositing sacrificial and structural material over a substrate to form a structural layer on a component electrically attached with the substrate. The galvanic potential of the structural layer is greater than the galvanic potential of the component. At least a portion of the structural material is covered with a protective material that has a galvanic potential less than or equal to the galvanic potential of the component. The sacrificial material is removed with a release solution. At least one of the protective material and release solution is surfactanated, the surfactant functionalizing a surface of the component.
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Buriak Jillian
Staple Bevan
Olsen Allan
PTS Corporation
Townsend and Townsend / and Crew LLP
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