Surface wave plasma processing system and method of using

Details Surface wave plasma processing system and method of using Surface wave plasma processing system and method of using

2006-11-21

2006-11-21

Dinh, Trinh Vo (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111010

Reexamination Certificate

active

07138767

ABSTRACT:
A SWP source includes an electromagnetic (EM) wave launcher configured to couple EM energy in a desired EM wave mode to a plasma by generating a surface wave on a plasma surface of the EM wave launcher adjacent the plasma. A power coupling system is coupled to the EM wave launcher and configured to provide the EM energy to the EM wave launcher for forming the plasma. A cover plate coupled to the plasma surface of the EM wave launcher protects the EM wave launcher from the plasma.

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patent: 5024716 (1991-06-01), Sato
patent: 5028847 (1991-07-01), Greb et al.
patent: 5225740 (1993-07-01), Ohkawa
patent: 6029602 (2000-02-01), Bhatnagar

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