Semiconductor device manufacturing: process – Radiation or energy treatment modifying properties of...
Reexamination Certificate
2006-08-09
2009-08-25
Cao, Phat X (Department: 2813)
Semiconductor device manufacturing: process
Radiation or energy treatment modifying properties of...
C438S798000, C257SE21077
Reexamination Certificate
active
07579287
ABSTRACT:
A method for processing an object containing moisture is provided to efficiently remove the moisture and to prevent re-adsorption of the moisture. In particular, the method has a step of removing the moisture contained in the object in an atmosphere containing excited hydrogen, deuterium, deuterated hydrogen, or tritium.
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Official Action dated Nov. 25, 2008 in Japanese Application No. 2006-211055.
Ishihara Shigenori
Kawase Nobuo
Canon Kabushiki Kaisha
Cao Phat X
Doan Nga
Fitzpatrick ,Cella, Harper & Scinto
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