Radiant energy – Irradiation of objects or material
Reexamination Certificate
2006-04-04
2006-04-04
Wells, Nikita (Department: 2881)
Radiant energy
Irradiation of objects or material
C250S492300
Reexamination Certificate
active
07023002
ABSTRACT:
Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.
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Hayashi Daisuke
Honda Minoru
Kamigori Akiko
Murakami Koichi
Nagaseki Kazuya
Smith, II Johnnie L.
Tokyo Electron Limited
Wells Nikita
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