Surface treating device and surface treating method

Details Surface treating device and surface treating method Surface treating device and surface treating method

2006-04-04

2006-04-04

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S492300

Reexamination Certificate

active

07023002

ABSTRACT:
Installed in a vacuum chamber is a mounting table for supporting semiconductor wafer, which is a substrate to be treated, with an electron beam irradiation mechanism mounted on the ceiling of the vacuum chamber for generating electron beams. The mounting table is adapted to be vertically moved by a lifting/lowering device, allowing the distance between the electron beam irradiating mechanism and the semiconductor wafer to be set at a desired value. This makes it possible to perform a uniform satisfactory treatment over the entire surface of the substrate to be treated.

REFERENCES:
patent: 3553709 (1971-01-01), Jones
patent: 4954717 (1990-09-01), Sakamoto et al.
patent: 5796116 (1998-08-01), Nakata et al.
patent: 5909032 (1999-06-01), Wakalopulos
patent: 6087071 (2000-07-01), Komori
patent: 6197704 (2001-03-01), Endo et al.
patent: 6657212 (2003-12-01), Komori et al.
patent: 2002/0074519 (2002-06-01), Yamaguchi
patent: 0 986 072 (2000-03-01), None
patent: 1 215 706 (2002-06-01), None
patent: 1215706 (2002-06-01), None
patent: 03-260073 (1991-11-01), None
patent: 2002-341100 (2002-11-01), None
patent: WO 96/36070 (1996-11-01), None

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