Surface processing apparatus utilizing microwave plasma

Details Surface processing apparatus utilizing microwave plasma Surface processing apparatus utilizing microwave plasma

1980-11-19

1982-07-13

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192E, 204164, 156345, 118620, 422186, C23C 1500, C23F 100

Patent

active

043393268

ABSTRACT:
There is provided an apparatus for processing a surface of an object to be processed by utilizing microwave plasma within a plasma-producing chamber, which comprises a microwave power-generating means; a wave guide for transmitting microwaves generated from said microwave power-generating means; a closed vessel constituting the plasma-producing chamber separated from said wave guide by a separating means; an antenna for transmitting microwaves, one end thereof protruding into the wave guide and another end thereof protruding into the closed vessel and a supporting means, for holding or supporting the electroconductive object to be processed, provided within the closed vessel and so attached to the antenna that the antenna and the electroconductive object may be electrically connected to each other.

REFERENCES:
patent: 4265730 (1981-05-01), Hirose et al.

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