Surface processing apparatus

Details Surface processing apparatus Surface processing apparatus

2006-02-28

2006-02-28

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

Reexamination Certificate

active

07005660

ABSTRACT:
A surface processing apparatus which enables the electron beam energy to be reduced with a simplified construction. A wafer W as an object to be processed is placed in a processing chamber. The wafer is mounted on a mounting stage inside the processing chamber. An electron beam irradiating device is provided on the processing chamber such as to face the mounting stage and irradiates at least one electron beam toward the wafer. A self-generated electric field generator is provided between the electron beam irradiating device and the mounting stage and generates at least one self-generated electric field.

REFERENCES:
patent: 4705956 (1987-11-01), Ward
patent: 4902898 (1990-02-01), Jones et al.
patent: 5583344 (1996-12-01), Mizumura et al.
patent: 6770402 (2004-08-01), Suguro et al.
patent: 2002-182000 (2002-06-01), None

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