Surface modification to create regions resistant to adsorption o

Details Surface modification to create regions resistant to adsorption o Surface modification to create regions resistant to adsorption o

1991-04-25

1995-02-21

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430927, 430271, 435176, 435177, 435181, 436525, 436527, 436528, 436905, 427553, G03C 173, C12N 1106

Patent

active

053914635

ABSTRACT:
Irradiating, with ultraviolet light, surfaces which contain thiol groups, epoxy groups, or vicinal diol groups, results in surfaces which exhibit a reduced adsorption of biomolecules. In the case of surfaces having thiol groups such irradiation also results in a reduced capacity for the bonding of heterobifunctional crosslinking reagents. Such irradiation may be carried out in a patternwise fashion to obtain patterned surfaces.

REFERENCES:
patent: 4562157 (1985-12-01), Lowe et al.
patent: 5077210 (1991-12-01), Eigler et al.
patent: 5079600 (1992-01-01), Schnur et al.
Schoen et al, Annual International Conference of the IEEE Engineering in icine and Biology Society, vol. 12, No. 4, p. 1739 (1990).
Bhatia et al, Anal. Biochem., vol. 178, pp. 408-413 (1989).

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