Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-04-14
1987-12-29
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
156643, 156646, 20419237, C23C 1400
Patent
active
047159413
ABSTRACT:
A silicon-modified organic surface is roughened by treatment with an oxygen containing plasma. If necessary the organic surface may be silicon-modified by treatment with a silicon containing material prior to plasma treatment. The roughened organic surface provides improved adhesion to other organic surfaces and to deposited metals. Improvements in methods for laminating organic surfaces and for depositing metals on organic surfaces which achieve improved adhesion are disclosed. Structures comprising laminated organic layers or metal deposited on organic surfaces which provide improved adhesion between the organic layers or between the metal and the organic surface are also disclosed.
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Jones Carol R.
Susko Robin A.
Demers Arthur P.
International Business Machines - Corporation
Kenemore Max J.
Levy Mark
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