Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-02-04
1990-06-12
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
156643, C23C 1434
Patent
active
049330608
ABSTRACT:
A method to modify the surface or fluoropolymer by a reactive gas plasma so that the surfaces have improved fluoropolymer to other substrate adhesive bond strength.
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Melliar-Smith et al., "Thin Film Processes" Vossen and Kern Academic Press, New York, pp. 500-513, (1978).
Butler Richard J.
Nickoson Carl G.
Prohaska George W.
Curatolo Joseph G.
Evans Larry W.
Gilbert Teresan W.
Marquis Steven P.
Niebling John F.
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