Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2011-03-15
2011-03-15
Toatley, Gregory J (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
C356S237600, C356S369000
Reexamination Certificate
active
07907268
ABSTRACT:
A surface inspection method inspects a surface of a wafer having a repeated pattern formed by double patterning. The method includes: a first step (S121) which applies an inspection light to a surface of a wafer; a second step (S122) which detects a diffracted light from the surface of the wafer to which the inspection light has been applied; and a third step (S123) which checks whether a defect is present in the repeated pattern according to the diffracted light detected in the second step. The second step detects a diffracted light corresponding to a pattern having a pitch multiplied by 2 with respect to the pitch of the repeated pattern.
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Fujimori Yoshihiko
Kudo Yuji
Alli Iyabo S
Morgan & Lewis & Bockius, LLP
Nikon Corporation
Toatley Gregory J
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