Surface fabricating device

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

118730, 118 501, 118620, 156646, 156656, 156657, 1566591, 156662, 156345, 20419237, 20429836, 427 38, H01L 21306, B44C 122, C23F 102

Patent

active

051104075

ABSTRACT:
Anisotropic etching can be obtained in the direction of the incident heated beam of reactive gas with the introduction of a second material for controlling reactivity.

REFERENCES:
patent: 4734152 (1988-03-01), Geis et al.
patent: 4874459 (1989-10-01), Coldren et al.
patent: 4874460 (1989-10-01), Nakagawa et al.

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