X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1995-04-25
1996-10-22
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 73, G01N 2370
Patent
active
055685315
ABSTRACT:
A surface defect evaluating apparatus comprises an X-ray generator having a non-winding type cathode, a first slit device for shaping the X-ray flux from the X-ray generator, a diffraction crystal for obliquely receiving a slit-form X-ray flux passing through the slit device and diffracting the X-ray flux on a specific crystal plane, a second slit device for shaping the X-ray flux from the diffraction crystal, a photographic plate for detecting the intensity distribution of the flux diffracted on the specific crystal plane of a sample such as a semiconductor wafer after a slit-form X-ray flux passing through the second slit device obliquely irradiates the sample, a slit device, and a scintillator, installed at the back side of the photographic plate for detecting the intensity of the X-ray flux.
REFERENCES:
patent: 5170422 (1992-12-01), Fiebiger
Kawabata Atsushi
Nishihagi Kazuo
Porta David P.
Technos Co. Ltd.
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