Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2006-12-08
2008-11-04
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
Reexamination Certificate
active
07445725
ABSTRACT:
Etching the surface (activating the surface) of a halogenated polymer component with an electron beam generates a set of free radical sites in polymeric chains of the surface that sustain for at least 4 hours in an inert environment. The inert environment is provided by a noble gas, nitrogen, a static free space, and/or a vacuum. Items such as dynamic seals, static seals, gaskets, pump diaphragms, hoses, and o-rings all benefit from precursors made according to the technique.
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Olsen Allan
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