Suppression of graphite formation during laser etching of diamon

Details Suppression of graphite formation during laser etching of diamon Suppression of graphite formation during laser etching of diamon

1993-05-21

1994-08-02

Breneman, R. Bruce

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, H01L 21306

Patent

active

053342801

ABSTRACT:
Graphite formation on a diamond surface during laser etching is inhibited or the graphite is removed by contact with a gaseous material such as elemental hydrogen, elemental oxygen, an inert gas or a source of hydroxyl radicals. Preferably, the article being etched is cooled and maintained in an inert atmosphere during etching.

REFERENCES:
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Rothschild, "Excimer laser projection patterning with and without resists", Submicrometer etching of diamond and diamond-like carbon resist. SPIE vol. 633 Optical Microlithography v(1986) pp. 51-57.
Konov, "Light-Induced polishing of an evaporating surface". Sov. J. Quantum Electron 21(4), Apr. 1991 pp. 442-444.
Tezuka, "Processing of CVD Diamond Films by YAG Laser", J. of JAP Soc. of Precision Eng., vol. 56, No. 12, Dec. 1990.
Kononenko, "KrF of excimer laser etching of diamond-like carbon films." Proceedings of SPIE-Inter. Soc. of optical Eng. vol. 1759, 1992.
Armeyev, "Direct laser writing of microstructures in Diamond-like Carbon Films", Materials & Manuf. Processes, 8(1), 9-17 (1993), pp. 7-17.
Ageev, "Laser Processing of Diamond and Diamond-Like Films", Materials & Manuf. Processes, 8(1), 1-8 (1993) pp. 1-8.
Konov, "Pulse-periodic laser etching of diamond-like carbon coatings" Jou. J. Quantum Electron. 21(16) Oct. 1991, pp. 1112-1115.

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