Support table for plate-like body and processing apparatus using

Details Support table for plate-like body and processing apparatus using Support table for plate-like body and processing apparatus using

1991-07-18

1993-06-22

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

118724, 156643, 20429837, H01L 21306, B44C 122

Patent

active

052214036

ABSTRACT:
A wafer support table is provided in a vacuum chamber of a magnetron plasma etching apparatus. This support table includes a first member having a mechanism for adjusting the temperature of a wafer, a second member having an electrostatic chuck for supporting the wafer on its upper surface, and a gas supply mechanism for supplying a gas between the first and second members.

REFERENCES:
patent: 4878995 (1989-11-01), Arikado et al.
patent: 4956043 (1990-09-01), Kanetomo et al.

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