Support material for electron beam systems

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2504421, 346158, 21912131, H01J 3720

Patent

active

047773715

ABSTRACT:
Support elements for electron beam systems for semiconductor manufacture must be subject to at most minimal temperature influences, as they have important effects on the adjustment precision. The composition of such support elements from a glass ceramic with a crystalline phase with high quartz structure and with a residual vitreous phase permits extensive compensation of the thermal expansion of the two phases. The use of the glass ceramic for mask substrate, mask cassettes, receiving table with support arm, and mirror substrate reduces the time requirement as well as the error susceptibility in the temperature control of the system.

REFERENCES:
patent: 3834981 (1974-09-01), Grossman et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Support material for electron beam systems does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Support material for electron beam systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Support material for electron beam systems will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1959732

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.