Support and seal structure for CCVD reactor

Details Support and seal structure for CCVD reactor Support and seal structure for CCVD reactor

1991-03-22

1992-04-21

Shoap, Allan N.

Coating apparatus

Gas or vapor deposition

Chamber seal

277 12, 277101, 384100, 248637, 248694, C23C 1600, F16J 1502, F16C 3206

Patent

active

051057620

ABSTRACT:
Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

REFERENCES:
patent: Re28031 (1974-06-01), Fortier
patent: 1979680 (1934-11-01), Engel
patent: 2520771 (1950-08-01), Martin et al.
patent: 2913007 (1959-11-01), Morrison
patent: 2957717 (1960-10-01), Bram
patent: 2965067 (1960-12-01), Amelotte et al.
patent: 3137530 (1964-06-01), Kohler
patent: 3350105 (1967-10-01), Browning et al.
patent: 3367667 (1968-02-01), Allen
patent: 3726433 (1973-04-01), Andrews
patent: 4035037 (1977-07-01), Cunningham
patent: 4048955 (1977-09-01), Anderson
patent: 4076335 (1978-02-01), Ahmed et al.
patent: 4114959 (1978-09-01), Christ
patent: 4123989 (1978-11-01), Jewett
patent: 4278624 (1981-07-01), Kornylak
patent: 4422988 (1983-12-01), Kornylak
patent: 4430149 (1984-02-01), Berkman
patent: 4630568 (1986-12-01), Kieser
patent: 4702500 (1987-10-01), Than, Jr. et al.

Affiliated with

Also associated with

Rating

Support and seal structure for CCVD reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Support and seal structure for CCVD reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Support and seal structure for CCVD reactor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1578565